![]() ![]() Most of the work has been directed towards EUV mask inspection and how to optimize the mask to facilitate inspection. We will discuss the sensitivity of the inspection tools and mask design factors that affect tool sensitivity. The NGL technologies that we have studied include SCALPEL, PREVAIL, EUV lithography, and Step and Flash Imprint Lithography. Stokowski, Stanley E.įor the last five years KLA-Tencor and our joint venture partners have pursued a research program studying the ability of optical inspection tools to meet the inspection needs of possible NGL lithographies. A champion approach has been identified based on a multibeam technology from Carl Zeiss. As of late 2014 SUNY Poly SEMATECH completed a review, system analysis, and proof of concept evaluation of multiple e-beam technologies for defect inspection. Highspeed massively parallel e-beam defect inspection has been identified as the leading candidate for addressing the key gaps limiting today's patterned defect inspection techniques. To support the industry in meeting these challenges SUNY Poly SEMATECH has evaluated disruptive technologies that can meet the requirements for high volume manufacturing (HVM), for both the wafer fab and the mask shop. ![]() It is unlikely that continued incremental improvements to either technology will meet tomorrow's requirements, and therefore a new inspection technology approach is required one that combines the high-throughput performance of optical with the high-sensitivity capabilities of e-beam inspection. E-beam inspection offers the highest sensitivity but has historically lacked the throughput required for widespread adoption in the manufacturing environment. Optical inspection offers the highest throughput and is the current workhorse of the industry for both wafer and mask inspection. The tradeoffs between sensitivity and throughput for optical and e-beam inspection are well understood. In particular, the challenges associated with nanoimprint and extreme ultraviolet (EUV) mask inspection require new strategies that enable fast inspection at high sensitivity. In parallel, gaps in mask inspection capability are growing as new generations of mask technologies are developed to support these sub-10nm wafer manufacturing requirements. The new device architectures and materials being introduced for sub-10nm manufacturing, combined with the complexity of multiple patterning and the need for improved hotspot detection strategies, have pushed current wafer inspection technologies to their limits. Wurm, Stefan Jindal, Vibhu Mukhtar, Maseeh Quoi, Kathy Kemen, Thomas Zeidler, Dirk Eberle, Anna Lena Garbowski, Tomasz Dellemann, Gregor Peters, Jan Hendrik Malloy, Matt Thiel, Brad Bunday, Benjamin D. He has received four awards, including the Romanian Academy Prize for Physics in 1979.Enabling inspection solutions for future mask technologies through the development of massively parallel E-Beam inspection Also, he has theorized on present-day Mars meteorology and Mars terraforming and on several macro-engineering projects. His mainstream scientific contributions consist of about 250 papers and several books related to statistical physics, thermodynamics, the physics of semiconductors, the various aspects of terrestrial and space solar energy applications and other energy-related issues. ![]() Viorel Badescu is affiliated with the Candida Oancea Institute and a Professor in the Department of Engineering Thermodynamics at the Polytechnic University of Bucharest. He also has interests in technology foresight, horizon scanning and roadmapping, and is a fellow of the Royal Aeronautical Society. Malcolm has diverse research interests, with activities spanning space and aerospace technology, including mission and system design, astrodynamics, and swarm and disaggregated system engineering. on a range of European Space Agency projects and missions, including ADM-Aeolus and LISA-Pathfinder, progressing to become a senior member of technical staff. From 2005–2008 he worked at SciSys UK Ltd. He studied for his PhD at the University of Glasgow from 2000–2002, prior to gaining a research assistant post until December 2004. Malcolm Macdonald is Associate Director of the Advanced Space Concepts Laboratory within the Department of Mechanical and Aerospace Engineering at the University of Strathclyde. ![]()
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